Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene.
نویسندگان
چکیده
This communication reports an approach based on plasma-enhanced atomic layer deposition of aluminium oxide for the functionalization of polytetrafluoroethylene (PTFE or "Teflon") surfaces. Alternating exposure of PTFE to oxygen plasma and trimethylaluminium causes a permanent hydrophilic effect, and a more than 10-fold improvement of the "glueability" of PTFE to aluminium.
منابع مشابه
Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
The suitability of three vapor deposition techniques for pore size modification was evaluated using polycarbonate track etched membranes as model supports. A feature scale model was employed to predict the pore geometry after modification and the resulting pure water flux. Physical vapor deposition (PVD) and pulsed plasma-enhanced chemical vapor deposition (PECVD), naturally, form asymmetric na...
متن کاملMicrostructure and open-circuit voltage of nÀiÀp microcrystalline silicon solar cells
A series of microcrystalline silicon n2i2p solar cells has been deposited by very high frequency plasma enhanced chemical vapor deposition at various values of silane to hydrogen source gas ratio and on two different substrate types. Relationships between microstructure and electrical characteristics of these solar cells are investigated by transmission electron microscopy, atomic force microsc...
متن کاملEffect of Temperature and Gas Flux on the Mechanical Behavior of TiC Coating by Pulsed DC Plasma Enhanced Chemical Vapor Deposition(TECHNICAL NOTE)
There are many factors such as voltages, duty cycle, pressure, temperatures and gas flux in coatings process that were effective in changing coatings characteristic. In this paper in plasma enhanced chemical vapor deposition (PECVD) technique, temperature and gas flux are two important variants that affecting the coatings structure and mechanical properties. All TiC coating deposited on a hot...
متن کاملOptimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications
Silicon oxynitride (SiOxNy:H) layers were grown from 2%SiH4/N2 and N2O gas mixtures by plasma-enhanced chemical vapor deposition (PECVD). Layer properties such as refractive index, deposition rate, thickness non-uniformity and hydrogen bond content were correlated to the relevant deposition parameters including radio frequency power, chamber pressure, total gas flow, substrate temperature and N...
متن کاملAtomic/molecular layer deposition: a direct gas-phase route to crystalline metal-organic framework thin films.
Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal-organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید
ثبت ناماگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید
ورودعنوان ژورنال:
- Chemical communications
دوره 51 17 شماره
صفحات -
تاریخ انتشار 2015